Mr. Yuan Jinqing, Chairman of HMT, Mr. Fu Zhiwei, Chairman of Xuzhou Bokang, and other industry leaders were invited to attend the Taihu Lake Forum on New Electronic Materials held in Yixing, Jiangsu on October 14, and participated in the close-door discussions to actively make suggestions for industrial development. The meeting was hosted by China Petroleum and Chemical Industry Federation and organized by the Department of Raw Materials.
Government departments and enterprises attending the forum are as follows:
The Ministry of Industry and Information technology, etc., key electronic new material enterprises, integrated circuit enterprises, scientific research institutes, advantageous enterprises in various material fields, and downstream chip enterprises such as Changjiang storage and Hefei Changxin.
Actively Participate in National Development & Contribute to the Implementation of the 14th Five-Year Plan
In the 14th Five-Year Plan, it is pointed out that we should adhere to the core position of innovation in the overall situation of China's modernization and take the self-reliance and self-improvement of science and technology as the strategic support for national development. Facing the forefront of world science and technology and major national needs, we will firmly implement the strategy of rejuvenating the country through science education and the strategy of innovation driven development, continuously improve the national innovation system and accelerate the construction of a strong country with science and technology.
Under this trend, the science and technology industry will encounter major development opportunities during the 14th Five-Year Plan period. In order to respond to the national call and thoroughly implement the policy of rejuvenating the country through science and technology, based on current achievements in the field of automobile airbag, HMT takes strategic investment in Xuzhou Bokang as a new breakthrough, enters the field of photoresist production and manufacturing, and deepens its layout in the field of high-tech new materials.
Advantages of Xuzhou Bokang
As a local Chinese enterprise, Xuzhou Bokang can produce medium- and high-end photo etching materials on a large scale. The company has a number of proprietary intellectual property rights, including 248nm, 193nm, and e-beam photoresist patents.
Leading Enterprises Undertaking National Key Projects
Since 2017, Bokang has undertaken the development and industrialization of 193 nm photoresist in the national 02 special project, and was officially listed as the national standard maker of photoresist monomer by the state in 2019.
Excellent Professionals Forming A Core Team
The core team of the company is composed of domestic and foreign experts with high standards and high degrees, and most of the members have overseas study and research experience. R&D personnel account for more than 50%. In the team, 32 people have doctor degrees, and 85% of the team members have bachelor's degrees or above. In addition, the company also introduced 4 national experts and 15 overseas experts. Fu Zhiwei, Chairman of the group, is an expert in the national "Ten Thousand Plan".
Complete Photoresist Industry Chain
Bokang has a complete photoresist supply chain (monomer + resin + photoacid + photoresist), which enables the company to fully realize the production from initial raw materials to finished photoresist independently, and is familiar with the production of thousands of supporting materials.
Bokang has 20+ R & D / cooperative development projects involving ArF, KrF, Iline, Ebeam and Bumping resist. Photoresist resins include electronic grade PMMA, PHS, Acrylate, etc. the functional polymer production system adopted is 50 +.
Development Opportunities of Photoresist Industry
The domestic photoresist industry has also encountered a rare development opportunity. This development opportunity is mainly reflected in the following three aspects:
First, with the widespread use of chips, fabs have expanded production scale and increased production speed, thus driving demand for wafer materials such as photoresist;
Second, the market demand for better performance and higher capacity of chips promotes the technological upgrading of chips and their manufacturing processes, which leads to the upgrading demand of photoresist and other materials;
Third, chipmaking currently requires foreign technology, but there is a shortage of chips because foreign manufacturers are unable to supply some components due to political factors. In this case, the localization of photoresist and other key materials must be accelerated. Domestic chipmakers have a strong incentive to work with local photoresist manufacturers to solve the supply problem of photoresist and other wafer materials.
Prospects for Future Development
In the future, under the leadership of the 14th Five-Year plan, the scientific and technological revolution will receive more and more attention, or set off a new round of upsurge of technological upgrading. As a leading enterprise in the field of automotive passive safety, HMT will continue to make efforts in this field and continue to deepen its vertical development.
From the perspective of horizontal development, HMT will invest more in the photoresist industry, make good use of its existing advantages, expand the upstream and downstream of relevant industries, and strive to contribute to the development of the photoresist industry.